Home Faculty and Research Bridget R. Rogers
Bridget R. Rogers PDF Print E-mail
Associate Professor of Chemical and Biomolecular Engineering

Education

B.S., ChE University of Colorado, 1984

M.S., ChE Arizona State University, 1990

Ph.D., ChE Arizona State University, 1998

Contact Information

Dept. of Chemical and Biomolecular Engineering
Vanderbilt University
VU Station B, Box 351604
Nashville, TN 37235-1604

Phone: (615) 343-3269
FAX: (615) 343-7951

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Research

The focus of our research is on surfaces, interfaces, and films of technically important materials. We work to establish relationships between the processing parameters, the material properties, and finally the performance of the film in its proposed application. We create films using chemical vapor deposition and characterize them using spectroscopic ellipsometry, medium energy ion beam backscattering, Rutherford backscattering spectrometry, Auger electron spectroscopy, x-ray photoelectron spectroscopy, and x-ray diffraction. We currently have three project thrusts.


UHV-CVD reactor used for process-property-performance studies.

  • UHV-CVD of Alumina and Zirconia thin films for high-permittivity gate dielectrics. Application- CMOS transistors.
  • Understanding the effects of high temperature, dissociated oxygen/nitrogen environments on ultra-high temperature ceramic composites (eg. Hf(Zr)B2/SiC). Application- Sharp leading edges and control surfaces for hypersonic flight.
  • Engineer coatings that will perform in high-temperature, high-flow, reactive environments. Applications: Carbon composites for use in harsh environments


TEM cross-sections of zirconia films deposited
on hydrogen-terminated (a,b) and native oxide (c,d) silicon surfaces


Spectroscopic ellipsometer used to characterize materials.


Industrial Experience:

1984-1998: Motorola, Inc., Semiconductor Products Sector, Mesa, AZ

Selected Publications

Geil, R. D., B. R. Rogers, Z. Song, “Determination of Optimum Depth-Resolution Conditions for Time-Of-Flight Medium Energy Backscattering,” submitted to Nuclear Instruments and Methods, March 2005.

Song, Z., R. D. Geil, B. R. Rogers, N. D. Theodore, M. L. Kottke, P. Mack, “An In-depth Investigation of The Initial Stage Deposition of ZrO2 on H-terminated Si (100) and Native Silicon Oxide Surfaces,” submitted to Thin Solid Films January 2005.

Fang, H., T. Miller, B. R. Rogers, R. H. Magruder, III, R. A. Weller, “The Effect of Oxygen Content on Piezoresistivity of Indium Tin Oxide Thin Films Prepared by Pulsed Laser Deposition,” J. Appl. Phys 97 (2005): 083502-1 - 083502-5.

Song, Z. and B. R. Rogers, “In-situ Ellipsometric Study of The Initial Deposition of ZrO2 on H-Si and Native Silicon Oxide Surfaces by HV-CVD,” JVST A, 23(2005): 165-176.

Geil, R. D., B. R. Rogers, R. A. Weller and Z. Song, “Interfacial Analysis Using Time-of-Flight Medium Energy Backscattering,” JVST A, 22(2004): 1129-1133.

Song, Z., B. R. Rogers, and N. D. Theodore, “Spectroscopic Ellipsometry Characterization of Thin ZrO2 Films on Si (100) Deposited by HV-MOCVD,” JVST A, 22(2004): 711-718.

Marschall, Jochen, A. Chamberlain, D. Crunkleton, and B. Rogers, “Catalytic Atom Recombination on ZrB2/SiC and HfB2/SiC Ultra-High Temperature Ceramic Composites,” AIAA Journal of Spacecraft and Rockets, 41(2004), 576-581, 2004.

Rogers, B.R. and T. S. Cale, “Plasma Processes in Microelectronic Device Manufacturing,” Vacuum 65, (2002): 267-279.

Rogers, B. R., "Underlayer Work Function Effects on Nucleation and Film Morphology of CVD Aluminum,” Thin Solid Films 408 (2002):87-96.

Telari, K. A., B. R. Rogers, L. Shen, H. Fang, R. A. Weller, and D. N. Braski, "Characterization of Platinum Deposited by Focussed Ion Beam-Assisted Chemical Vapor Deposition,” J. Vac. Sci. Technol. B, 20, no. 2, (2002): 590-595.

Jonnalagadda, R., D. Yang, J. T. Hillman, R. F. Foster, B. R. Rogers, and T. S. Cale, “Programmed Substrate Temperature Ramping to Increase Nucleation Density and Decrease Surface Roughness During MOCVD of Aluminum,” Journal of Materials Research 14 (1999): 1982- 1989. (

Cale, T. S., B. R. Rogers, T. P. Merchant, and L. J. Borucki, “Deposition and Etch Processes: Continuum Film Evolution in Microelectronics,” Computational Materials Science 12 (1998): 333-353.

Rogers, B. R., and T. S. Cale, "Spatial Composition Variation in Sputtered Ti-W Films,” Thin Solid Films 236 (1993): 334.

Rogers, B. R., "AES Determination of Compositional Variation in LPCVD Tungsten Silicide Films in Confined Spaces,” Surface and Interface Analysis 18 (1992): 173.

Rogers, B. R., S. R. Wilson, and T. S. Cale, "Localized Corrosion of Aluminum-1.5% Copper Thin Films Exposed to Photoresist Developing Solutions,” JVST A 9, no. 3 (1991): 1616.